Speaker
Description
Aiming to the production of 1 emA U3x+ intense highly charged ion beam, the 4th generation ECR ion source 45 GHz FECR (First 4th generation ECR ion source) is under development at IMP. Fundamental progresses have been made towards this challenging machine. The first superconducting ECR ion source magnet based on Nb3Sn technology is going to be in place to provide sufficient magnetic confinement to the 45 GHz microwave heated plasma. A new microwave coupling method called the Vlasov launcher has been proposed and successfully tested that can enhance the peak performance by 20% or higher. High power plasma chamber incorporated with the micro-channel cooling concept has been successfully developed and put in operation to handle the very challenging localized over-heating with the power dump density of ~10 MW/m2 or beyond, which enables the long-term stable operation of an ECR ion source at 10 kW power level. Careful tuning of a 24 GHz ECR ion source operating at afterglow mode has made very intense pulsed highly charged ion beams. Typical ion beams such as 503 eμA Xe30+, 266 eμA Xe34+, 169 eμA Xe38+ and 50 eμA Xe42+ at the FWHM pulse length of ~10 ms have been produced. Intense ion beams have been already used for routine operation at IMP, such as the continuous operation of Kr26+ or Xe32+ at the intensities of 200~300 eμA. This paper will present the status of the FECR and the key technologies to make it work at high microwave power and high intensity ion beam production.
| Funding Agency | NSFC with contract No. 11427904, 12025506 |
|---|---|
| Email Address | sunlt@impcas.ac.cn |
| I have read the Code of Conduct to attend ICIS2023. | Yes |
